Ceramic Sputtering Target
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![4N ZrO2 Sputtering Target Nrog Cu Backplate]()
4N ZrO2 Sputtering Target Nrog Cu BackplatePeb cov zirconium dioxide sputtering lub hom phiaj nrog cov ntawv thaub qab yog tsim los siv siab -purity zirconium dioxide cov ntaub ntawv, ruaj ruaj rau cov hlau thaub qab phaj; Qhov kev tsim no...Ntau -
![ZrC Sputtering Target Nrog Cu Backplate]()
ZrC Sputtering Target Nrog Cu BackplatePeb Zirconium Carbide (ZrC) sputtering lub hom phiaj nrog tooj liab thaub qab daim hlau feature ib tug ruaj khov daim ntawv cog lus ntawm lub siab -purity ZrC lub hom phiaj cov khoom thiab cov...Ntau -
![Ta 5at% Doped ZrC Sputtering Target]()
Ta 5at% Doped ZrC Sputtering TargetNthuav doping ntawm Zirconium Carbide nrog 5 atomic feem pua ntawm Tantalum ho txhim kho lub hom phiaj cov ntaub ntawv siab - kub tsis kam, thermal shock resistance, thiab corrosion kuj....Ntau -
![4N IGZO Sputtering Target]()
4N IGZO Sputtering TargetPeb 4N IGZO sputtering lub hom phiaj xa ntau ruaj khov thiab ua tau zoo sputtering kev ua tau zoo. Tshwj xeeb rau siab -kawg zaub thiab daim ntawv thov semiconductor, lawv pab txhawb kev paub txog...Ntau -
![4N HfO2 Lub Hom Phiaj Nrog Cu Backplate]()
4N HfO2 Lub Hom Phiaj Nrog Cu Backplate4N HfO₂ Sputtering Target nrog Copper Backing siv 99.99% purity hafnium oxide khoom. Integrated nrog ib tug tooj liab thaub qab, nws muaj zoo heev thermal conductivity thiab yog zoo tagnrho rau...Ntau -
![4N HfO2 Doped Nrog 2% Ti Target]()
4N HfO2 Doped Nrog 2% Ti TargetLub hom phiaj 2% Ti-doped HfO₂ sputtering lub hom phiaj yog tsim siv lub siab -purity hafnium oxide substrate, precisely doped nrog 2% titanium. Characterized by its compositional uniformity and...Ntau -
![4N HfO2 Sputtering Target]()
4N HfO2 Sputtering Target4N High-Purity Hafnium Dioxide Sputtering Target (99.99% Purity) - haum rau kev siv hauv cov txheej txheem kho qhov muag, cov khoom siv hluav taws xob, thiab cov khoom siv hluav taws xob...Ntau -
![B4C Sputtering Target]()
B4C Sputtering TargetSiv siab -purity boron carbide raw cov ntaub ntawv, cov khoom no tshwj xeeb hardness thiab robust thermal stability, ua rau nws zoo tagnrho rau kev siv nyob rau hauv semiconductor manufacturing,...Ntau -
![Customized HfC Particles]()
Customized HfC ParticlesKev piav qhia Ntawm Cov Khoom Siv HfC HfC feem ntau yog tsim los ntawm reacting hafnium dioxide (HfO₂) nrog cov pa roj carbon ntawm qhov kub siab (1900-2300 degree) nyob rau hauv ib qho inert...Ntau -
![Tin Oxide (SnO2) Sputtering Target]()
Tin Oxide (SnO2) Sputtering TargetTin oxide phiaj (SnO2) yog ib qho tseem ceeb inorganic non-metallic khoom. Vim nws qhov tshwj xeeb ntawm lub cev thiab tshuaj lom neeg, nws ua lub luag haujlwm tseem ceeb hauv ntau qhov chaw ua...Ntau -
![Tantalum Oxide (Ta2O5) Sputtering Target]()
Tantalum Oxide (Ta2O5) Sputtering TargetTantalum Oxide Sputtering Target tuaj yeem siv rau hauv semiconductor, tshuaj vapor deposition (CVD), lub cev vapor deposition (PVD) zaub, thiab kev siv kho qhov muag. Peb yog cov chaw muag khoom...Ntau -
![Titanium Oxide (TiO2) Sputtering Target]()
Titanium Oxide (TiO2) Sputtering TargetTitanium dioxide (TiO2) yog feem ntau siv cov xim dawb, piv txwv li hauv cov xim. Nws muaj qhov ci ci siab thiab qhov ntsuas siab siab heev (2.609 rau rutile).Ntau
Peb yog cov kws tshaj lij ceramic sputtering cov neeg muag khoom hauv Suav teb, tshwj xeeb hauv kev muab cov kev pabcuam zoo. Peb sov siab txais tos koj mus yuav luv nqi ceramic sputtering lub hom phiaj hauv Tshuag ntawm no thiab tau txais cov qauv dawb los ntawm peb lub hoobkas. Rau nqe kev sab laj, tiv tauj peb.