PVD Txheej Khoom

  • 4N ZrO2 Sputtering Target Nrog Cu Backplate
    Peb cov zirconium dioxide sputtering lub hom phiaj nrog cov ntawv thaub qab yog tsim los siv siab -purity zirconium dioxide cov ntaub ntawv, ruaj ruaj rau cov hlau thaub qab phaj; Qhov kev tsim no...
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  • ZrC Sputtering Target Nrog Cu Backplate
    Peb Zirconium Carbide (ZrC) sputtering lub hom phiaj nrog tooj liab thaub qab daim hlau feature ib tug ruaj khov daim ntawv cog lus ntawm lub siab -purity ZrC lub hom phiaj cov khoom thiab cov...
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  • Ta 5at% Doped ZrC Sputtering Target
    Nthuav doping ntawm Zirconium Carbide nrog 5 atomic feem pua ​​​​ntawm Tantalum ho txhim kho lub hom phiaj cov ntaub ntawv siab - kub tsis kam, thermal shock resistance, thiab corrosion kuj....
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  • 4N IGZO Sputtering Target
    Peb 4N IGZO sputtering lub hom phiaj xa ntau ruaj khov thiab ua tau zoo sputtering kev ua tau zoo. Tshwj xeeb rau siab -kawg zaub thiab daim ntawv thov semiconductor, lawv pab txhawb kev paub txog...
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  • 4N HfO2 Lub Hom Phiaj Nrog Cu Backplate
    4N HfO₂ Sputtering Target nrog Copper Backing siv 99.99% purity hafnium oxide khoom. Integrated nrog ib tug tooj liab thaub qab, nws muaj zoo heev thermal conductivity thiab yog zoo tagnrho rau...
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  • 4N HfO2 Doped Nrog 2% Ti Target
    Lub hom phiaj 2% Ti-doped HfO₂ sputtering lub hom phiaj yog tsim siv lub siab -purity hafnium oxide substrate, precisely doped nrog 2% titanium. Characterized by its compositional uniformity and...
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  • 4N HfO2 Sputtering Target
    4N High-Purity Hafnium Dioxide Sputtering Target (99.99% Purity) - haum rau kev siv hauv cov txheej txheem kho qhov muag, cov khoom siv hluav taws xob, thiab cov khoom siv hluav taws xob...
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  • Customizable 4N Carbon Sputtering Target
    Peb lub siab -purity 4N carbon sputtering lub hom phiaj yog tsim los ntawm 99.99% cov khoom siv roj carbon ntshiab, muaj cov qib impurity tsawg thiab ua rau lawv zoo tagnrho rau kev siv hauv...
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  • B4C Sputtering Target
    Siv siab -purity boron carbide raw cov ntaub ntawv, cov khoom no tshwj xeeb hardness thiab robust thermal stability, ua rau nws zoo tagnrho rau kev siv nyob rau hauv semiconductor manufacturing,...
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  • Kev cai Boron Sputtering Targets
    Peb muab siab -purity, ntom boron lub hom phiaj zoo kawg nkaus haum rau cov txheej txheem semiconductor thiab txheej txheej. Peb txhawb kev tsim khoom raws li kev kos duab kos duab, nruj me ntsis...
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  • Customized 3N5 Round Tungsten Target
    Peb muab kev cai- ua lub hom phiaj tungsten ncig nrog 3N5 purity (99.95%). Ua los ntawm cov hmoov hlau metallurgy, lawv muaj cov qauv microstructure, siab ceev, thiab tsis muaj porosity thiab...
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  • Customized High Purity Hf Sputtering Target
    Peb muab kev cai - ua siab - purity hafnium sputtering lub hom phiaj nrog purity tshaj 99.9%, featuring uniform ntom thiab zoo microstructure. Tshwj xeeb tsim rau semiconductor chips, optical...
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Peb yog cov kws tshaj lij pvd txheej cov khoom siv hauv Suav teb, tshwj xeeb hauv kev muab cov kev pabcuam zoo. Peb sov siab txais tos koj mus yuav luv nqi pvd txheej khoom hauv Tshuag ntawm no thiab tau txais cov qauv dawb los ntawm peb lub hoobkas. Rau nqe kev sab laj, tiv tauj peb.